| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a coating film for lithography, reducing the coating defect significantly by using a composition for forming a coating film for lithography.SOLUTION: In a method for forming a coating film for lithography on a substrate for manufacturing a semiconductor device, by using a rotary coating device including an integrated filter integrating the housing and a filtration film, rotary coating the substrate for manufacturing a semiconductor device with a composition for forming a coating film for lithography, and then heating the substrate for manufacturing a semiconductor device coated with the composition for forming a coating film for lithography, a filter is used as the integrated filter, in which the weight of eluate per one filter extracted when circulating an organic solvent at a rate of 10 ml per minute for 24 hours is 3 mg or less.SELECTED DRAWING: None |
