| 摘要 |
PROBLEM TO BE SOLVED: To provide a proximity type exposure technique capable of keeping a distance between a photomask and a substrate fixed by automatically adjusting flatness on a surface plate for placing a substrate to be exposed, and also coping with a local gap change.SOLUTION: A proximity system exposure apparatus comprises: gap measurement means for measuring a gap (distance) 7 between a large substrate 2 and a photomask 1 for exposing the large substrate 2 at a preset position on the large substrate 2; and a surface plate 3 for placing the large substrate 2. The surface plate 3 comprises means for measuring the gap at the preset position on the large substrate 2 by the gap measurement means and for vertically elevating and lowering the substrate. The vertically elevating and lowering means are mechanisms arranged at fixed intervals on the surface plate and can be vertically elevated and lowered, and the mechanisms are vertically elevated and lowered on the basis of the measurement values of the gaps.SELECTED DRAWING: Figure 1 |
