发明名称 LARGE AREA INDUCTIVE COUPLED PLASMA REACTOR
摘要 A large area inductive coupled plasma reactor is provided to increase control capacity for plasma ion energy by variably controlling power for a flat electrode with a power control unit. A vacuum chamber(110) has a susceptor(112) on which a target substrate(114) is placed. Plural linear plasma generating units(130) are installed across an upper portion of the vacuum chamber. The linear plasma generating unit includes plural parallel-arranged dielectric tubes(132) and antenna coils(136). The antenna coils are installed along the dielectric tubes. The antenna coils receive RF power from a main power supplying source(150) to transmit induced electromotive force for an induced coupled plasma generation into the vacuum chamber. A flat electrode(138) is installed along the antenna coil. The flat electrode is installed on each bottom in the dielectric tubes to be located under the antenna coil. A power control unit controls power applied to the flat electrode.
申请公布号 KR20080024693(A) 申请公布日期 2008.03.19
申请号 KR20060089119 申请日期 2006.09.14
申请人 NEW POWER PLASMA CO., LTD. 发明人 CHOI, DAI KYU
分类号 H01L21/3065 主分类号 H01L21/3065
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