发明名称 |
LARGE AREA INDUCTIVE COUPLED PLASMA REACTOR |
摘要 |
A large area inductive coupled plasma reactor is provided to increase control capacity for plasma ion energy by variably controlling power for a flat electrode with a power control unit. A vacuum chamber(110) has a susceptor(112) on which a target substrate(114) is placed. Plural linear plasma generating units(130) are installed across an upper portion of the vacuum chamber. The linear plasma generating unit includes plural parallel-arranged dielectric tubes(132) and antenna coils(136). The antenna coils are installed along the dielectric tubes. The antenna coils receive RF power from a main power supplying source(150) to transmit induced electromotive force for an induced coupled plasma generation into the vacuum chamber. A flat electrode(138) is installed along the antenna coil. The flat electrode is installed on each bottom in the dielectric tubes to be located under the antenna coil. A power control unit controls power applied to the flat electrode.
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申请公布号 |
KR20080024693(A) |
申请公布日期 |
2008.03.19 |
申请号 |
KR20060089119 |
申请日期 |
2006.09.14 |
申请人 |
NEW POWER PLASMA CO., LTD. |
发明人 |
CHOI, DAI KYU |
分类号 |
H01L21/3065 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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