发明名称 COMPOSITION FOR FORMING CONDUCTIVE PATTERN AND METHOD FOR FORMING CONDUCTIVE PATTERN
摘要 [Problem] To provide: a composition for forming a conductive pattern by means of light irradiation or microwave irradiation, which is capable of improving the electrical conductivity of a conductive pattern; and a method for forming a conductive pattern. [Solution] A composition for forming a conductive pattern by means of light irradiation or microwave irradiation, which contains (A) at least one metal compound selected from among metal salts of organic carboxylic acids having 2-18 carbon atoms and organic metal complexes that do not contain an organic carboxylic acid as a ligand, (B) a metal material, (C) a resin and (D) a solvent, and wherein: the mass ratio of the total mass, in terms of metal atoms, of (A) at least one metal compound selected from among metal salts of organic carboxylic acids having 2-18 carbon atoms and organic metal complexes that do not contain an organic carboxylic acid as a ligand to the total metal mass of (B) a metal material, namely ((A) at least one metal compound selected from among metal salts of organic carboxylic acids having 2-18 carbon atoms and organic metal complexes that do not contain an organic carboxylic acid as a ligand):((B) a metal material) is from 80:20 to 2:98.
申请公布号 WO2016152722(A1) 申请公布日期 2016.09.29
申请号 WO2016JP58509 申请日期 2016.03.17
申请人 SHOWA DENKO K.K. 发明人 UCHIDA Hiroshi;KURITANI Masumi;YONEDA Shuhei
分类号 H01B1/22;C08K3/08;C08K5/098;C08L101/00;C09D5/24;C09D7/12;C09D201/00;H01B13/00;H05K1/09;H05K3/10 主分类号 H01B1/22
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