发明名称 RESIST UNDER LAYER FILM COMPOSITION AND PATTERNING PROCESS
摘要 The present invention provides a resist under layer film composition containing a novolak resin having a repeating unit shown by the formula (1) and either or both of a novolak resin having a repeating unit shown by the formula (2) and a bisnaphthol derivative shown by the formula (3). There is provided a resist under layer film composition that is excellent in filling property, generates little outgas, and has excellent dry etching resistance and heat resistance.;
申请公布号 US2016358777(A1) 申请公布日期 2016.12.08
申请号 US201615149680 申请日期 2016.05.09
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 HATAKEYAMA Jun;WATANABE Takeru;KORI Daisuke
分类号 H01L21/033;H01L21/02;C09D161/06;H01L29/66;G03F7/11;H01L21/027;H01L21/311 主分类号 H01L21/033
代理机构 代理人
主权项 1. A resist under layer film composition comprising a novolak resin having a repeating unit shown by the formula (1) and either or both of a novolak resin having a repeating unit shown by the formula (2) and a bisnaphthol derivative shown by the formula (3),wherein R1 and R2 represent a hydrogen atom, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, an aryl group having 6 to 10 carbon atoms, or an aralkyl group having 7 to 10 carbon atoms, in which the alkyl group, the alkenyl group, the aryl group, and the aralkyl group may contain a fluorine atom(s) and may further contain a hydroxyl group, an alkoxy group, an acyl group, a sulfoxide group, a sulfo group, or an ester bond, and 10% or more of a total of R1 and R2 are groups containing at least one fluorine atom; R3, R4, R11, and R12 represent a hydrogen atom, a hydroxyl group, an alkoxy group having 1 to 4 carbon atoms, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or an aryl group having 6 to 10 carbon atoms, in which the alkyl group, the alkenyl group, and the aryl group may contain a hydroxyl group, an alkoxy group, an acyloxy group, an ether group, or a sulfide group; R18 and R19 represent a halogen atom or the same group as R3,R4, R11, and R12; R5, R6, R13, R14, R20, and R21 represent a hydrogen atom, or R5, R13, and R20 may bond to R6, R14, and R21 respectively to form an ether bond; R7 and R15 represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or an aryl group having 6 to 10 carbon atoms, in which the alkyl group, the alkenyl group, and the aryl group may contain a hydroxyl group, an alkoxy group, an acyloxy group, an ether group, a sulfide group, a chloro group, or a nitro group; R9, R10, R16, and R17 represent a hydrogen atom, an acid-labile group, a glycidyl group, or a linear, branched, or cyclic alkyl, acyl, or alkoxycarbonyl group having 1 to 10 carbon atoms; X1, X2, and X3 represent a single bond or a linear, branched, or cyclic divalent hydrocarbon group having 1 to 38 carbon atoms and optionally containing a hydroxyl group, a carboxyl group, an ether group, or a lactone ring, when X1 is a divalent hydrocarbon group, R5 and R6 may bond to carbon atoms in X1 to form an ether bond, when X2 is a divalent hydrocarbon group, R13 and R14 may bond to carbon atoms in X2 to form an ether bond, and when X3 is a divalent hydrocarbon group, R20 and R21 may bond to carbon atoms in X3 to form an ether bond; and a, b, c, d, g, h, i, j, k, l, m, and n are each 1 or 2.
地址 Tokyo JP