| 摘要 |
PROBLEM TO BE SOLVED: To highly accurately and rapidly evaluate a pattern even with a narrow width of tolerance data. SOLUTION: A pattern evaluation method includes steps of acquiring outline data of a pattern to be evaluated from a SEM image, calculating an inclination of the pattern from the acquired outline data, correcting difference in a rotation angle between design data and the outline data of the pattern based on the calculated inclination, comparing the corrected design data with the outline data, and determining whether or not a shape of the pattern to be evaluated is good from the comparison results. COPYRIGHT: (C)2007,JPO&INPIT
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