| 摘要 |
PROBLEM TO BE SOLVED: To provide a control method for reducing the consumption of a fluid for adjustment and the use force cost, while maintaining the quality of the process liquid supplied to a substrate, and to provide a substrate processing apparatus.SOLUTION: With regard to a process liquid pipeline having a double pipeline of an inner tube and an outer tube, when the total value of flow rate of the process liquid distributed in the inner tube of the process liquid pipeline in a predetermined first judgement time is less than a first threshold, the flow rate of a fluid for adjustment distributed in the outer tube is set to a first flow rate, and when the total value of flow rate of the process liquid distributed in the inner tube in a first judgement time exceeds the first threshold, the flow rate of the fluid for adjustment distributed in the outer tube is set to a second flow rate smaller than the first flow rate.SELECTED DRAWING: Figure 4 |
