发明名称 SEMICONDUCTOR DEVICE
摘要 An emitter electrode includes a first electrode layer, a second electrode layer, and a third electrode layer. The first to third electrode layers are laid in this order on an emitter layer. A solder layer is further laid on the third electrode layer. The first electrode layer covers the emitter layer and a gate oxide film in a front surface of a semiconductor chip. A first electroconductive material forming the first electrode layer has AlSi as its main component. A second electroconductive material forming the second electrode layer has a linear expansion coefficient different from that of the first electroconductive material and is lower in mechanical strength than the first electroconductive material. A third electroconductive material constituting the third electrode layer has a linear expansion coefficient different from that of the first electroconductive material and has solder wettability higher than that of the first electrode layer.
申请公布号 US2016380068(A1) 申请公布日期 2016.12.29
申请号 US201514956977 申请日期 2015.12.02
申请人 Mitsubishi Electric Corporation 发明人 NOBUKUNI Akihiko;OKI Hirofumi;TOMOMATSU Yoshifumi
分类号 H01L29/49;H01L29/739;H01L29/78 主分类号 H01L29/49
代理机构 代理人
主权项 1. A semiconductor device comprising: a semiconductor layer; a first electrode layer provided on a front surface of the semiconductor layer and formed of a first electroconductive material; a second electrode layer laid on the first electrode layer and formed of a second electroconductive material having a linear expansion coefficient different from that of the first electroconductive material and lower in mechanical strength than the first electroconductive material; and a third electrode layer laid on the second electrode layer and formed of a third electroconductive material having a linear expansion coefficient different from that of the first electroconductive material and having solder wettability higher than that of the first electroconductive material.
地址 Tokyo JP