| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a main lithographic apparatus reducing the exposure time spent by a substrate for pre- (or post-) exposing one or a plurality of edge devices on the substrate to increase throughput. <P>SOLUTION: The edge device does not ultimately produce a useful device and hence is exposed with first lithographic device having a resolution lower than a device used to produce one or a plurality of other complete devices produced from the substrate. Therefore, pre- (or post-) exposing of the edge device is realized using a less complex and less expensive lithographic device. <P>COPYRIGHT: (C)2009,JPO&INPIT |
