发明名称 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
摘要 A negative resist composition is provided comprising (A) a polymer comprising recurring units having an acid-eliminatable group and recurring units capable of generating acid upon exposure and (B) a carboxylic acid onium salt. When the negative resist composition is processed by the microprocessing technology, especially EB lithography, it forms a pattern having a very high resolution and minimal LER.
申请公布号 US2016299430(A1) 申请公布日期 2016.10.13
申请号 US201615091092 申请日期 2016.04.05
申请人 Shin-Etsu Chemical Co., Ltd. 发明人 Domon Daisuke;Masunaga Keiichi;Watanabe Satoshi
分类号 G03F7/038;G03F1/76;G03F1/78;G03F7/20;G03F7/32 主分类号 G03F7/038
代理机构 代理人
主权项 1. A negative resist composition comprising (A) a polymer comprising recurring units having the general formula (1) and recurring units of at least one type selected from units having the general formulae (a1), (a2), and (a3):wherein A is a single bond or a C1-C10 alkylene group which may contain an ethereal oxygen atom at an intermediate of the chain, R1 is hydrogen, fluorine, methyl or trifluoromethyl, R2 is hydrogen, halogen, an optionally halo-substituted, straight, branched or cyclic C2-C8 acyloxy group, an optionally halo-substituted, straight, branched or cyclic C1-C6 alkyl group, or an optionally halo-substituted, straight, branched or cyclic C1-C6 alkoxy group, L is hydrogen, a monovalent, straight, branched or cyclic, aliphatic C1-C10 hydrocarbon group which may contain an ethereal oxygen atom, carbonyl moiety or carbonyloxy moiety at an intermediate of the chain, or an optionally substituted monovalent aromatic group, Rx and Ry each are hydrogen, a C1-C15 alkyl group which may be substituted with hydroxy or alkoxy, or an optionally substituted monovalent aromatic group, Rx and Ry may bond together to form a ring with the carbon atom to which they are attached, excluding the case where Rx and Ry are hydrogen at the same time, f is an integer of 1 to 3, s is an integer of 0 to 2, a is an integer (5+2s-f), and m is 0 or 1,wherein R12 is each independently hydrogen or methyl, R13 is a single bond, phenylene group, —O—R22—, or —C(═O)—Z2—R22—, Z2 is oxygen or NH, R22 is a straight, branched or cyclic C1-C6 alkylene, alkenylene or phenylene group which may contain a carbonyl (—CO—), ester (—COO—), ether (—O—) or hydroxyl moiety, L′ is a single bond or —Z3—C(═O)—O—, Z3 is a straight, branched or cyclic divalent C1-C20 hydrocarbon group which may be substituted with a heteroatom, Z1 is a single bond, methylene, ethylene, phenylene, fluorinated phenylene, —O—R23—, or —C(═O)—Z4—R23—, Z4 is oxygen or NH, R23 is a straight, branched or cyclic C1-C6 alkylene, alkenylene or phenylene group which may contain a carbonyl, ester, ether or hydroxyl moiety, M− is a non-nucleophilic counter ion, R14, R15, R16, R17, R18, R19, R20, and R21 are each independently a straight C1-C20, branched or cyclic C3-C20 monovalent hydrocarbon group in which at least one hydrogen atom may be replaced by a heteroatom selected from oxygen, sulfur, nitrogen and halogen, or in which a heteroatom selected from oxygen, sulfur and nitrogen may intervene, so that a hydroxyl group, cyano group, carbonyl group, ether bond, ester bond, sulfonic acid ester bond, carbonate bond, lactone ring, sultone ring, carboxylic anhydride, or haloalkyl group may form or intervene, or R14 and R15 may bond together to form a ring with the sulfur atom, or any two or more of R16, R17 and R18 or any two or more of R19, R20 and R21 may bond together to form a ring with the sulfur atom, and (B) a salt having the general formula (3a): R11—CO2−M+  (3a)wherein R11 is a straight, branched or cyclic C1-C20 alkyl group, C2-C20 alkenyl group or C6-C20 aryl group, which may contain fluorine, nitrogen, ether moiety, ester moiety, lactone ring, lactam ring, carbonyl moiety, or hydroxyl moiety, and M is a substituent-bearing counter cation selected from sulfonium, iodonium and ammonium cations.
地址 Tokyo JP