发明名称 MANUFACTURING METHOD FOR SEMICONDUCTOR CHIPS
摘要 The semiconductor chip manufacturing process is carried out in processes including a protective sheet sticking process for sticking a protective sheet onto a first surface of a semiconductor wafer so that the sheet comes in contact with the TEG, a mask placing process for placing a mask on a second surface that is a surface opposite from the first surface, a plasma etching process for performing plasma etching from the second surface to remove portions corresponding to dividing regions and separate device-formation-regions into individual semiconductor chips, and a TEG removing process for removing the TEG in a state where it remains unremoved in the dividing regions and stuck to the protective sheet together with the protective sheet by peeling off the protective sheet.
申请公布号 KR20070089122(A) 申请公布日期 2007.08.30
申请号 KR20077008200 申请日期 2005.12.21
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 ARITA KIYOSHI;NAKAGAWA AKIRA
分类号 H01L21/66 主分类号 H01L21/66
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