发明名称 窒化物系半導体装置
摘要 The objective of the present invention is to provide a nitride semiconductor device that prevents breakdown of a gate insulating film and is capable of normally-off bidirectional operation having increased reliability. A nitride semiconductor element (10) is provided with a first MOSFET unit (30) and a second MOSFET unit (31); and a first SBD metal electrode (28) and a second SBD metal electrode (29) provided between a first gate electrode (26) and a second gate electrode (27) form a Schottky junction with an AlGaN layer (20). Also, the first SBD metal electrode (28) and a first electrode (24) are connected and are electrically shorted, and the second SBD metal electrode (29) and a second electrode (25) are connected and are electrically shorted.
申请公布号 JP5985162(B2) 申请公布日期 2016.09.06
申请号 JP20110177703 申请日期 2011.08.15
申请人 富士電機株式会社 发明人 上野 勝典
分类号 H01L27/095;H01L21/336;H01L21/338;H01L21/8234;H01L27/088;H01L29/47;H01L29/778;H01L29/78;H01L29/786;H01L29/812;H01L29/861;H01L29/868;H01L29/872 主分类号 H01L27/095
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