发明名称 Semiconductor integrated circuit and its manufacturing method
摘要 A method for manufacturing a semiconductor integrated circuit includes steps of forming a semiconductor element on a semiconductor substrate and separating only a function layer including the semiconductor element, which is a surface layer of the semiconductor substrate, from the semiconductor substrate. The semiconductor element is preferably a compound semiconductor device including at least one of a light emitting diode, a vertical cavity surface emitting laserdiode, a photodiode, a high electron mobility transistor, an inductor, a capacitor, a resistor, and a heterojunction bipolar transistor. <IMAGE>
申请公布号 EP1326288(A3) 申请公布日期 2004.11.17
申请号 EP20020258802 申请日期 2002.12.19
申请人 SEIKO EPSON CORPORATION 发明人 KONDO, TAKAYUKI
分类号 H01L21/331;H01L21/02;H01L21/20;H01L21/306;H01L21/336;H01L21/338;H01L21/60;H01L27/12;H01L27/15;H01L29/737;H01L29/778;H01L29/786;H01L29/812;H01L51/52 主分类号 H01L21/331
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