DEVICE FOR DETECTING ADJUSTMENT OF GAP BETWEEN UPPER ELECTRODE AND LOWER ELECTRODE IN ETCHING EQUIPMENT

摘要

An apparatus for detecting the horizontality of a gap between electrodes in etching equipment is provided to generate a selective alarm by automatically measuring an interval of the gap between upper and lower electrodes in every process of a wafer and by detecting whether the measured interval of the gap falls within a tolerance range. A lower electrode(30) is fixed to a lower floating base(36) which selectively inserts the lower electrode to a chamber. The lower floating base that reciprocates vertically is supported by a lower fixing base. A plurality of sensors(S1,S2,S3) measure an interval between the lower electrode and an upper electrode(13), fixed to the upper surface of the lower fixing base. A monitoring apparatus gives an alarm to an operator according as the sensor measures the interval of the gap between the upper and the lower electrodes and transmits a control signal for stopping the operation of the entire apparatus. Three sensors can be installed in positions having equal intervals of 120 degrees.