发明名称 |
High mobility power metal-oxide semiconductor field-effect transistors |
摘要 |
High mobility P-channel power metal oxide semiconductor field effect transistors. In accordance with an embodiment of the present invention, a power MOSFET is fabricated such that the holes flow in an inversion/accumulation channel, which is along the (110) crystalline plane, or equivalents, and the current flow is in the [110] direction, or equivalents, when a negative potential is applied to the gate with respect to the source. The enhanced channel mobility of holes leads to a reduction of the channel portion of the on-state resistance, thereby advantageously reducing total “on” resistance of the device. |
申请公布号 |
US9425043(B2) |
申请公布日期 |
2016.08.23 |
申请号 |
US200611644553 |
申请日期 |
2006.12.22 |
申请人 |
Vishay-Siliconix |
发明人 |
Pattanayak Deva;Chen Kuo-In;Chau The-Tu |
分类号 |
H01L29/04;H01L21/02;H01L29/739;H01L29/06;H01L29/423;H01L29/78 |
主分类号 |
H01L29/04 |
代理机构 |
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代理人 |
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主权项 |
1. A vertical trench silicon MOSFET comprising:
a (110) wafer including:
an orientation flat;a trench perpendicular to the orientation flat of the (110) wafer, wherein the trench includes a plurality of trench surfaces; anda channel, wherein the orientation flat is a [111] directed flat, and wherein the trench surfaces are bounded by {111} equivalent planes. |
地址 |
Santa Clara CA US |