发明名称 High mobility power metal-oxide semiconductor field-effect transistors
摘要 High mobility P-channel power metal oxide semiconductor field effect transistors. In accordance with an embodiment of the present invention, a power MOSFET is fabricated such that the holes flow in an inversion/accumulation channel, which is along the (110) crystalline plane, or equivalents, and the current flow is in the [110] direction, or equivalents, when a negative potential is applied to the gate with respect to the source. The enhanced channel mobility of holes leads to a reduction of the channel portion of the on-state resistance, thereby advantageously reducing total “on” resistance of the device.
申请公布号 US9425043(B2) 申请公布日期 2016.08.23
申请号 US200611644553 申请日期 2006.12.22
申请人 Vishay-Siliconix 发明人 Pattanayak Deva;Chen Kuo-In;Chau The-Tu
分类号 H01L29/04;H01L21/02;H01L29/739;H01L29/06;H01L29/423;H01L29/78 主分类号 H01L29/04
代理机构 代理人
主权项 1. A vertical trench silicon MOSFET comprising: a (110) wafer including: an orientation flat;a trench perpendicular to the orientation flat of the (110) wafer, wherein the trench includes a plurality of trench surfaces; anda channel, wherein the orientation flat is a [111] directed flat, and wherein the trench surfaces are bounded by {111} equivalent planes.
地址 Santa Clara CA US