| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology capable of generating a high quality thin film.SOLUTION: A thin film formation system 1 includes: a plasma generation part 3 which generates plasma; a base material holding part 2 which holds a base material 10; a conductive dividing plate 4 which divides a plasma chamber Q1 in which the plasma generation part 3 is disposed from a film formation chamber Q2 in which the base material holding part 2 is disposed; a plasma material gas supply part 5 which supplies a gas that is a plasma material to the plasma chamber Q1; a film formation material gas supply part 7 which supplies a gas that is a film formation material to the film formation chamber Q2; and a pulse power source 9 which applies a pulse voltage to an area between the dividing plate 4 and the base material holding part 2. |
