| 摘要 |
<p>A storage medium storing an exposure condition determination program, a method for determining an exposure condition, an exposure method, and a manufacturing method of a device are provided to calculate a phase projected on a substrate or a resist phase by reproducing an actual exposure result. A method for determining an exposure condition comprises the following steps: a step for setting a light source wavelength, a pattern of a mask, and an aberration of a projection optical system(S101); a step for determining an optical device of an illumination optical system(S102); a step for setting an initial value of a parameter based on a constraint condition of the illumination optical system(S103); a step for calculating an available light source by reading the parameter and the light source wavelength(S104); a step for calculating a pattern phase of the mask projected on a wafer(S105); a step for estimating the pattern phase(S106); and a step for determining an estimated value based on a predetermined reference value(S107).</p> |
