发明名称 SUBSTRATE TABLE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
摘要 A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.
申请公布号 US2016170310(A1) 申请公布日期 2016.06.16
申请号 US201615048826 申请日期 2016.02.19
申请人 ASML NETHERLANDS B.V. 发明人 TEN KATE Nicolaas;LAFARRE Raymond Wilhelmus Louis
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项
地址 Veldhoven NL