发明名称 |
COATING METHOD, COMPUTER STORAGE MEDIUM AND COATING APPARATUS |
摘要 |
There is provided a coating method which can apply a coating solution uniformly onto a substrate surface while reducing the amount of the coating solution supplied. The coating method for applying a coating solution onto a wafer includes the steps of: supplying a solvent for the coating solution onto the wafer to form an annular liquid film of the solvent in a peripheral area of the wafer; supplying the coating solution to the center of the wafer while rotating the wafer at a first rotational speed (time t1-t2); and allowing the coating solution to spread on the wafer by rotating the wafer at a second rotational speed which is higher than the first rotational speed (time t4-t5). The supply of the solvent is continued until just before the coating solution comes into contact with the liquid film of the solvent (time t0-t3). |
申请公布号 |
SG10201510099R(A) |
申请公布日期 |
2016.07.28 |
申请号 |
SG10201510099R |
申请日期 |
2015.12.09 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
TAKAFUMI HASIMOTO;SHINICHI HATAKEYAMA;NAOKI SHIBATA;KOUSUKE YOSHIHARA;MINORU KUBOTA;HIROYUKI IDE |
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