发明名称 |
ETCHANT SOLUTIONS AND METHOD OF USE THEREOF |
摘要 |
Etching compositions and method of using the etching compositions comprising potassium hydroxide; one or more than one additional alkaline compounds selected from the group consisting of TEAH, TMAF and NH 4 OH; and water; or etching compositions comprising one or more than one inorganic alkali basic hydroxides selected from the group consisting of potassium hydroxide, cesium hydroxide, sodium hydroxide, rubidium hydroxide, or lithium hydroxide; optionally one or more than one additional alkaline compounds; water; and optionally one or more corrosion inhibitors; wherein the composition preferentially etches silicon present on a substrate as compared to silicon dioxide present on said substrate. |
申请公布号 |
SG10201510712P(A) |
申请公布日期 |
2016.07.28 |
申请号 |
SG10201510712P |
申请日期 |
2015.12.29 |
申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
GENE EVERAD PARRIS;WILLIAM JACK CASTEEL, JR.;TIANNIU CHEN |
分类号 |
C09K13/02;C09G1/04;C09K13/08;H01L21/302;H01L21/306 |
主分类号 |
C09K13/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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