发明名称 METALIZED SUBSTRATE, AND ITS MANUFACTURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a metalized substrate having a new structure, and capable of improving connection strength of wire bonding even after heating in mounting a semiconductor chip. <P>SOLUTION: This metalized substrate has, on a high-melting-point metal layer formed on a ceramic substrate, a base nickel plated layer, a layered nickel-phosphorus plated metal layer, a diffusion prevention plated layer and a gold plated layer in this order; any of a nickel plated layer, a nickel-boron plated layer and a nickel-cobalt plated layer is used for the base nickel plated layer; and any of a columnar nickel-boron plated layer, a palladium-phosphorus plated layer and a palladium plated layer is used for the diffusion prevention plated layer. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2008311316(A) 申请公布日期 2008.12.25
申请号 JP20070155706 申请日期 2007.06.12
申请人 TOKUYAMA CORP 发明人 IMAI TETSUO;YATABE OSAMU;MAEDA MASAKATSU
分类号 H01L23/14 主分类号 H01L23/14
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