| 摘要 |
Methods and systems are disclosed for analyzing a scanning interferometry signal. Steps include: providing a scanning interferometry signal produced by a scanning interferometer for a first location of a test object (e.g., a sample having a thin film); providing a model function of the scanning interferometry signal produced by the scanning interferometer, wherein the model function is parametrized by one or more parameter values; fitting the model function to the scanning interferometry signal for each of a series of shifts in scan position between the model function and the scanning interferometry signal by varying the parameter values; and determining information about the test object (e.g., a surface height or height profile, and/or a thickness or thickness profile for a thin film in the test object) at the first location based on the fitting. |
