发明名称 Method of forming nano dots, method of fabricating the memory device including the same, charge trap layer including the nano dots and memory device including the same
摘要 Provided are a method of forming nano dots, method of fabricating a memory device including the same, charge trap layer including the nano dots and memory device including the same. The method of forming the nano dots may include forming cores, coating surfaces of the cores with a polymer, and forming graphene layers covering the surfaces of the cores by thermally treating the cores coated with the polymer. Also, the cores may be removed after forming the graphene layers. In addition, the surfaces of the cores may be coated with a graphitization catalyst material before coating the cores with the polymer. Also, the cores may include metal particles that trap charges and may also function as a graphitization catalyst.
申请公布号 US2009101964(A1) 申请公布日期 2009.04.23
申请号 US20080081357 申请日期 2008.04.15
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI JAE-YOUNG;SHIN HYEON-JIN;YOON SEON-MI
分类号 H01L21/336;B01J19/00;B05D3/00;G11B11/105;H01L29/792 主分类号 H01L21/336
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