| 发明名称 |
Metal chelating compositions |
| 摘要 |
<p>A metal chelating composition having the formula: €ƒ€ƒ€ƒ wherein Q is a carrier; S 1 is a spacer; L is -A-T-CH(X)-; A is an amide linkage; T is a bond or substituted or unsubstituted alkyl or alkenyl; X is -(CH 2 ) k COOH; k is an integer from 0 to 2; Y is -COOH; Z is -COOH; and i is an integer from 0 to 4.</p> |
| 申请公布号 |
EP1627683(A3) |
申请公布日期 |
2006.12.20 |
| 申请号 |
EP20050013282 |
申请日期 |
2001.04.10 |
| 申请人 |
SIGMA ALDRICH COMPANY |
发明人 |
KAPPEL, WILLIAM K.;MEHIGH, RICHARD J.;VISWANATHA, VENKATAPPA;DAPRON, JOHN;LI, HANDONG |
| 分类号 |
B01J20/281;C07C233/00;B01D15/08;B01J45/00;C07C233/45;C07C303/22;C07C309/18;C07C319/20;C07C323/58;C07F15/04;C07K1/32;G01N30/88 |
主分类号 |
B01J20/281 |
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