发明名称 流体制御システム、流体制御方法
摘要 A fluid control system includes a vacuum chamber, a gas supply source to supply gas as a fluid, an exhaust pipe to discharge the fluid from the vacuum chamber, a gas supply pipe to connect the vacuum chamber to the gas supply source, and a pressure sensor to detect an internal pressure of the vacuum chamber. This system further includes a flowmeter placed between the gas supply source and the vacuum chamber, a proportional valve placed between the flowmeter and the vacuum chamber, a pressure controller to control the proportional valve based on output of the pressure sensor, a metering valve placed on the exhaust pipe, and a flow controller to control the metering valve based on an output of the flowmeter.
申请公布号 JP5960614(B2) 申请公布日期 2016.08.02
申请号 JP20130002386 申请日期 2013.01.10
申请人 CKD株式会社 发明人 渡辺 雅之;山田 芳幸;梅澤 俊祐
分类号 G05D16/20;G05D7/06;H01L21/205;H01L21/31 主分类号 G05D16/20
代理机构 代理人
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