| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for controlling stages, which realize enhancement of the synchronization accuracy of the stages and of the throughput while maintaining high robustness. SOLUTION: A control section 51 consisting of controllers 54, 59 and FF controllers 56, 61 is provided for a wafer stage WS and a reticle fine-moving stage RFS. The control section 51 generates control signals CS1, DS1, CS2, DS2 for indicating thrusts, based on deviation signals ES1, ES2, which are the differences between reference signals RS1, RS2, which respectively indicate target positions of the wafer stage WS and of the reticle fine-moving stage RFS, and the actual positions of the respective stages. A calculation section 62 calculates synchronous error between the wafer stage WS and the reticle fine-moving stage RFS. A compensator 63 generates compensation signals MS1, MS2 for converging all of the deviation signals ES1, ES2, the synchronous error SS1, and the time integral value of the synchronous error SS1 to respective prescribed values. COPYRIGHT: (C)2005,JPO&NCIPI |
