发明名称 SUBSTRATE-TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce a power load, to increase the concentration of a solvent by supplying solvent vapor using a pressure difference without using any carrier gas, and to increase drying efficiency by allowing the solvent vapor to contribute to the substitution and drying of a treatment liquid efficiently. SOLUTION: A control section 67 reduces pressure in a chamber 27, and stops reducing pressure by exhaust pumps 19, 52 in vacuum and raises a lifter 31 to a drying position from a treatment position when a pressure detected by a pressure gauge 55 decreases below the vapor pressure curve of a solvent corresponding to the temperature of the solvent. The pressure is reduced below the vapor pressure curve, and a state, where the solvent becomes vapor easily, is achieved, thus generating solvent vapor sufficiently and reducing the power load even if the capacity of a heater 41 is small. The solvent vapor is introduced into the chamber 27 by the pressure difference, thus dispensing with the carrier gas and hence increasing the concentration of the solvent. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009004694(A) 申请公布日期 2009.01.08
申请号 JP20070166339 申请日期 2007.06.25
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 AIHARA TOMOAKI
分类号 H01L21/304;H01L21/306 主分类号 H01L21/304
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