发明名称 NOVOLAC TYPE PHENOLIC RESIN, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL, COATING FILM, AND RESIST COATING FILM
摘要 Provided are: a novolac type phenolic resin which is suitable for the achievement of a coating film that has excellent flexibility even if formed thick, while exhibiting excellent heat resistance, alkali developability, sensitivity and resolution; and the like. The present invention specifically provides a novolac type phenolic resin which is obtained by reacting (A) one or more phenolic trinuclear compounds selected from the group consisting of compounds represented by general formula (1) and compounds represented by general formula (2), (B) a monoaldehyde and (C) a polyaldehyde in the presence of an acid catalyst. (In the formulae, each of R1, R2 and R3 independently represents an optionally substituted alkyl group having 1-8 carbon atoms; R4 represents a hydrogen atom, an optionally substituted alkyl group or an optionally substituted aryl group; each of p and q independently represents an integer of 1-4; r represents an integer of 0-4; and s represents 1 or 2. In this connection, the sum of r and s is 5 or less.)
申请公布号 WO2016103850(A1) 申请公布日期 2016.06.30
申请号 WO2015JP78589 申请日期 2015.10.08
申请人 DIC CORPORATION 发明人 IMADA TOMOYUKI;NAGAE NORIO;SATO YUSUKE
分类号 C08G8/20;G03F7/023 主分类号 C08G8/20
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