| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist peeling method and a resist peeling device for accelerating the resist peeling speed.SOLUTION: In a method for supplying a mixture gas A, containing a hydrogen source into a space 2h while arranging a silicon substrate S, on which resist R is formed, in the space 2h where the pressure is maintained at a predetermined level or less, and bringing the mixture gas A into contact with a heated catalyst 10 placed in the space 2h, the mixture gas A contains oxygen. since the mixture gas A contains oxygen, when it is brought into contact with the catalyst 10, a hydroxyl radical can be generated together with the hydrogen radical. Consequently, the peeling speed can be accelerated by the synergetic effect of hydrogen radical and hydroxyl radical, compared with a case of only hydrogen radical.SELECTED DRAWING: Figure 1 |
