NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS

摘要

Sulfonate salts have the formula:
R 1 SO 3 -CH(Rf)-CF 2 SO 3 - M + wherein R 1 is alkyl or aryl, Rf is H or trifluoromethyl, and M + is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions.