发明名称 METHOD OF MANUFACTURING SUBSTRATE FOR ELECTRONIC MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a substrate for electronic material wherein the concentration of a reducing agent in a reducing agent containing cleaning liquid can be prevented from being dropped and the cleaning property of the cleaning liquid is hard to be degraded. SOLUTION: The method of manufacturing a substrate for electronic material includes a step to transfer a reducing agent containing cleaning liquid (A) accumulated in a container (T) to the substrate therefor from the container (T) and to clean the substrate therefor by using the transferred reducing agent containing cleaning liquid (A). In this case, the upper surface of the reducing agent containing cleaning liquid (A) accumulated in the container (T) is covered with an oxidation preventive material (B) of which specific value is smaller than that of the reducing agent containing cleaning liquid (A). COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008091416(A) 申请公布日期 2008.04.17
申请号 JP20060267892 申请日期 2006.09.29
申请人 SANYO CHEM IND LTD 发明人 TAMATOSHI RINA
分类号 H01L21/304 主分类号 H01L21/304
代理机构 代理人
主权项
地址