| 摘要 |
PROBLEM TO BE SOLVED: To disclose a substrate processing apparatus.SOLUTION: In the substrate processing apparatus, foreign matters existing, respectively, at an internal lower part and an internal upper part of a lower body are discharged, respectively, from the internal lower part and the internal upper part of a lower body via a first discharge pipe and a second discharge pipe. Consequently, the foreign matters existing in the lower body are discharged effectively to the outside. Since the substrate is prevented from being damaged, reliability of the substrate processing process is enhanced. |
