Fabrication of low defectivity electrochromic devices

摘要

Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.

主权项

1. A method of fabricating an electrochromic device coating on a glass substrate in a deposition system comprising a plurality of deposition stations, the method comprising:
translating a substrate holder holding the glass substrate in a substantially vertical orientation through at least a lithium deposition station and two or more deposition stations of the plurality of deposition stations; depositing a tungsten oxide based electrochromic material layer and a nickel oxide based counter electrode material layer on the glass substrate held in the substantially vertical orientation in the two or more deposition stations having two or more material sources; depositing lithium metal onto either or both of the tungsten oxide based electrochromic material layer and the nickel oxide based counter electrode material layer of the electrochromic device coating on the glass substrate in the substantially vertical orientation in the lithium deposition station having a lithium metal sputter target configured to deposit the lithium metal, wherein the lithium metal sputter target is comprised of between about 90% and about 99% by weight lithium metal; controlling, with a controller containing program instructions, the translation of the glass substrate through the plurality of the deposition stations and deposition of the tungsten oxide based electrochromic material layer, the nickel oxide based counter electrode material layer, and the lithium metal on the glass substrate; and wherein lithium metal is deposited in an amount sufficient to compensate blind charge in the electrochromic device coating and an additional amount of 1.5 to 2.5 times, by mass.