发明名称 |
Lithographic apparatus and method for measuring a pattern property |
摘要 |
<p>A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50x the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.</p> |
申请公布号 |
EP2131244(A2) |
申请公布日期 |
2009.12.09 |
申请号 |
EP20090161547 |
申请日期 |
2009.05.29 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
SLOTBOOM, DAAN;AARTS, IGOR;GEERKE, JOHAN |
分类号 |
G03F7/20;G03F9/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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