| 发明名称 |
MASKLESS LITHOGRAPHY FOR WEB BASED PROCESSING |
| 摘要 |
The present disclosure generally relates to a method and apparatus for processing a web-based substrate. As the substrate travels between rollers, the substrate may be stretched and thus distorted. Once the substrate reaches the roller, the substrate distortion is fixed. By adjusting the processing parameters, the distorted substrate is processed without correcting the distortion. |
| 申请公布号 |
US2016238941(A1) |
申请公布日期 |
2016.08.18 |
| 申请号 |
US201415026810 |
申请日期 |
2014.09.25 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
BENCHER Christopher Dennis |
| 分类号 |
G03F7/20;G03F7/24 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of processing a web substrate, comprising:
detecting that the substrate is distorted; and photolithographically processing the distorted substrate based upon the detected distortion. |
| 地址 |
Santa Clara CA US |
