| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the efficiency of the management of distortion data. <P>SOLUTION: A specific machine (machine A) that is a specific aligner is arbitrarily selected from among a plurality of aligners for exposing a substrate to light via a mask pattern. With the specific machine A as a reference, distortion related to each of general machines B-F that are aligners other than the specific machine is measured to acquire measurement error data, and the measurement error data is stored and managed. When relative error data between the general machines is required, difference operation is performed to obtain calculation error data, based on the stored and managed measurement error data. <P>COPYRIGHT: (C)2008,JPO&INPIT |
