参数决定方法、曝光方法、半导体装置制造方法、及储存媒体,申请号TW098107869-传众专利搜索

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发明名称	参数决定方法、曝光方法、半导体装置制造方法、及储存媒体
摘要
申请公布号	TWI421909	申请公布日期	2014.01.01
申请号	TW098107869	申请日期	2009.03.11
申请人	佳能股份有限公司日本	发明人	吉井启人;辻田好一郎;三上晃司
分类号	H01L21/027	主分类号	H01L21/027
代理机构		代理人	林志刚台北市中山区南京东路2段125号7楼
主权项
地址	日本

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