| 摘要 |
The purpose of the present invention is to provide a polymer which can be satisfactorily used as a positive resist which has a high γ value, and to provide a positive resist composition which can satisfactorily form a high-resolution pattern. The polymer contains an α-methylstyrene unit and an α-chloro-methyl acrylate unit, and the molecular weight distribution (Mw/Mn) is less than 1.48. This positive resist composition contains the aforementioned polymer and a solvent. |
