| 摘要 |
A method for fabricating an IC board without a ring structure is provided, in which after the completion of the core board (including the core through hole), the second pattern photoresist layer is used to mask over the first depositing metal layer, and portion of the second depositing metal layer (this portion of the second depositing metal layer is to electrically couple to the conductive circuit of the core through hole). Later, the second depositing metal layer, the first depositing metal layer, the metal layer, and even to the substrate at the innermost layer which are for the portion that are not masked by the second pattern photoresist layer are removed. As a result, the substrate is exposed to form the ringless structure, but which is to couple a conductive line to the core board through hole.
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