| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To manufacture an array substrate with four times of mask processes, to prevent undercut phenomenon in a two metal layered structure and form a forward-taper, and to prevent generation of wave noise and attain high-quality images and enlarge an opening region that realizes high luminance. <P>SOLUTION: A method includes a step of forming a gate electrode and gate line at a pixel unit of a first substrate by a first mask process; a step of forming an island-like active pattern, while a first insulating film exists at an upper portion of a gate electrode by a second mask process and forming a data line, crossing a gate line for defining a pixel region at the pixel unit; a step of forming a source and a drain electrode at the pixel unit by a third mask process to form a pixel electrode at the pixel region; a step of forming the source electrode and a drain electrode and the source and drain electrode patterns with forward-taper at the upper portions of the source and drain electrodes, respectively; and a step of forming a second insulating layer on the first substrate by a fourth mask process. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
