发明名称 Substrate for Exposure, Exposure Method and Device Manufacturing Method
摘要 A substrate for exposure prevents interference with a substrate holder at the time of being loaded onto the substrate holder and prevents a liquid from entering into a rear plane side after being loaded. A substrate (P) for exposure is a substrate to be exposed by irradiation of exposure light through the liquid, and has a size tolerance (DP) of an outer diameter (LP) of ±0.02 mm or less.
申请公布号 US2008318152(A1) 申请公布日期 2008.12.25
申请号 US20050662923 申请日期 2005.09.16
申请人 MIZUTANI TAKEYUKI 发明人 MIZUTANI TAKEYUKI
分类号 G03C1/00;G03F7/22 主分类号 G03C1/00
代理机构 代理人
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