发明名称 LIQUID CRYSTAL DEVICE, AND MANUFACTURING METHOD FOR SUBSTRATE FOR LIQUID CRYSTAL DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a liquid crystal device which is free of generation of a deposition defect region of an inorganic material, in the vicinity of the step part of a base layer of an alignment layer, even if the pixel pitch is 20μm or less and where the generation of the alignment defect of a liquid crystal due to the generation of the deposition defect region can be prevented. SOLUTION: In the liquid crystal device, inorganic alignment layers 36 and 42 are provided on the surfaces on the side of a liquid crystal layer 50 interposed between a pair of substrates 10 and 20 opposite to each other of the respective substrates. The base layer of the inorganic alignment layer 36 has the step part 80 on its surface, and the inorganic alignment layer 36 consists of a first inorganic obliquely deposited film 36a, consisting of an oblique columnar structure of an inorganic material and a second inorganic obliquely deposited film 36b formed on the vicinity region 80a of the step part 80 and the first inorganic obliquely deposited film 36a and consisting of an oblique columnar structure of an inorganic material. The azimuthal directions, along at least the planar directions of the substrates of the oblique directions of the columnar structures of the inorganic materials, which constitute the first and the second inorganic obliquely deposited films 36a and 36b, respectively, are made different from each other.</p>
申请公布号 JP2002277879(A) 申请公布日期 2002.09.25
申请号 JP20010074355 申请日期 2001.03.15
申请人 SEIKO EPSON CORP 发明人 TANAKA TAKAAKI;YAMAZAKI YASUSHI
分类号 G02F1/13;G02F1/1337;G02F1/1368;(IPC1-7):G02F1/133;G02F1/136 主分类号 G02F1/13
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