| 摘要 |
The present invention is generally directed to the materials processing regimes obtained with laser processing using ultra-short laser pulses of subpicosecond (i.e., up to hundreds of femtoseconds) duration, and to the altered materials obtained through such materials processing regimes. Thus various aspects of the present invention are directed to, for example, methods for altering materials by exposure of the materials to one or more pulses of a fs duration laser, while other aspects of the present invention are directed to, for example, materials altered by the methods of the invention. These macro-, micro-, and nanostructured materials have a variety of applications, including, for example, aesthetic applications such as jewelry or ornamentation; biomedical applications, especially medical applications involving biocompatibility bioperformance; catalysis applications; and modification of, for example, the optical and hydrophilic properties of materials.
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