Exposure apparatus, exposure method, and method for producing device

摘要

An exposure apparatus includes a projection system having a final element that projects exposure light to an upper surface of a substrate through liquid between the final element and the substrate. A liquid confinement member has a recovery outlet, via which the liquid is removed along with gas, arranged such that the upper surface of the substrate faces the recovery outlet, and the recovery outlet surrounds a path of the exposure light. The liquid confinement member confines the liquid to an area smaller than an area of the upper surface of the substrate by removing the liquid via the recovery outlet from a gap between the liquid confinement member and the upper surface of the substrate. A first support member supports the projection system, and a second support member supports the liquid confinement member, wherein the projection system is isolated from vibrations of the liquid confinement member.

主权项

1. An exposure apparatus comprising:
a projection system having a final element, the projection system projecting exposure light to an upper surface of a substrate through liquid between the final element and the upper surface of the substrate; a liquid supply inlet; a liquid recovery outlet; a liquid confinement member having the liquid recovery outlet via which the liquid is removed along with gas, the liquid recovery outlet being arranged such that the upper surface of the substrate faces the liquid recovery outlet, the liquid recovery outlet surrounding a path of the exposure light, the liquid recovery outlet being arranged radially outward of the liquid supply inlet with respect to the path of the exposure light, and the liquid confinement member confining the liquid to an area that is smaller than an area of the upper surface of the substrate by removing the liquid via the liquid recovery outlet from a gap between the liquid confinement member and the upper surface of the substrate; a first support member configured to support the projection system such that the final element of the projection system contacts the liquid on the upper surface of the substrate; and a second support member configured to support the liquid confinement member, wherein the projection system is isolated from vibrations of the liquid confinement member.