发明名称 SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, POWER CONVERSION APPARATUS, THREE-PHASE MOTOR SYSTEM, AUTOMOBILE, AND RAIL VEHICLE
摘要 In a semiconductor device having a silicon carbide device, a technique capable of suppressing variation in a breakdown voltage and achieving reduction in an area of a termination structure is provided. In order to solve the above-described problem, in the present invention, in a semiconductor device having a silicon carbide device, a p-type first region and a p-type second region provided to be closer to an outer peripheral side than the first region are provided in a junction termination portion, a first concentration gradient is provided in the first region, and a second concentration gradient larger than the first concentration gradient is provided in the second region.
申请公布号 EP3046149(A1) 申请公布日期 2016.07.20
申请号 EP20130892962 申请日期 2013.09.09
申请人 HITACHI, LTD. 发明人 MOCHIZUKI, KAZUHIRO;KAMESHIRO, NORIFUMI
分类号 H01L29/861;H01L21/329;H01L29/06;H01L29/16;H01L29/872 主分类号 H01L29/861
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