发明名称 |
METHOD AND APPARATUS FOR MONITORING PLASMA-INDUCED DAMAGE USING DC FLOATING POTENTIAL OF SUBSTRATE |
摘要 |
A method for monitoring plasma-induced damage to a substrate while being processed in a plasma CVD apparatus includes: measuring DC floating potential of the substrate using a detection electrode in contact with the substrate while the substrate is processed in the apparatus; and detecting abnormality as plasma-induced damage based on the measured DC floating potential.
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申请公布号 |
US2009056627(A1) |
申请公布日期 |
2009.03.05 |
申请号 |
US20070847962 |
申请日期 |
2007.08.30 |
申请人 |
ASM JAPAN K.K. |
发明人 |
SHUTO MITSUTOSHI;FUKASAWA YASUSHI;SUZUKI YASUAKI |
分类号 |
B05C11/00;G01N27/66;G01R29/12 |
主分类号 |
B05C11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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