发明名称 NOVEL TRISILYL AMINE DERIVATIVE, METHOD FOR PREPARING THE SAME AND SILICON-CONTAINING THIN FILM USING THE SAME
摘要 Provided are a novel trisilyl amine derivative, a method for preparing the same, and a silicon-containing thin film using the same, wherein the trisilyl amine derivative, which is a compound having thermal stability, high volatility, and high reactivity and being present in a liquid state at room temperature and under pressure where handling is possible, may form a high purity silicon-containing thin film having excellent physical and electrical properties by various deposition methods.
申请公布号 US2016333030(A1) 申请公布日期 2016.11.17
申请号 US201515110692 申请日期 2015.01.08
申请人 DNF CO.,LTD. 发明人 Jang Se Jin;Lee Sang-Do;Kim Jong Hyun;Kim Sung Gi;Kim Do Yeon;Yang Byeong-il;Seok Jang Hyeon;Lee Sang Ick;Kim Myong Woon
分类号 C07F7/10 主分类号 C07F7/10
代理机构 代理人
主权项 1. A trisilyl amine derivative represented by the following Chemical Formula 1: in Chemical Formula 1, R1 and R2 are each independently hydrogen, halogen, or (C1-C3)alkyl.
地址 Daejion KR