| 发明名称 |
INSPECTION METHOD AND APPARATUS, AND LITHOGRAPHIC APPARATUS |
| 摘要 |
A method of correcting an image characteristic of a substrate onto which one or more product features have been formed using a lithographic process, and an associated inspection apparatus method. The method includes measuring an error in the image characteristic of the substrate, and determining a correction for a subsequent formation of the product features based upon the measured error and a characteristic of one or more of the product feature(s). |
| 申请公布号 |
US2016327870(A1) |
申请公布日期 |
2016.11.10 |
| 申请号 |
US201415105517 |
申请日期 |
2014.11.07 |
| 申请人 |
ASML Netherlands B.V. |
发明人 |
RHE Kyu Kab;DECKERS David;SIMONS Hubertus Johannes Gertrudus;THEEUWES Thomas |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of correcting an image characteristic of a substrate onto which one or more product features have been formed using a lithographic process, the method comprising:
measuring an error in the image characteristic of the substrate; and determining a correction for a subsequent formation of the one or more product features based upon the measured error and a characteristic of one or more of the product feature(s). |
| 地址 |
Veldhoven NL |
