发明名称 A method of cleaning a substrate
摘要 <p>The invention provides a method of cleaning a substrate comprising the steps of: a. contacting at least 10 µg of C8-C30 fatty acid per cm 2 area of the substrate, and; b. exposing the substrate to a radiation in ultraviolet, visible or infrared spectrum.</p>
申请公布号 EP2036974(A1) 申请公布日期 2009.03.18
申请号 EP20070119609 申请日期 2007.10.30
申请人 UNILEVER N.V. 发明人 JAYARAMAN, SUJATHA;MADHAVAN, UMA;RAMAN, SRINIVASA GOPALAN;SAXENA, VISHAL
分类号 C11D3/20;C11D3/00;C11D7/26;C11D11/00 主分类号 C11D3/20
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