发明名称 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
摘要 |
In a lithographic apparatus the shape of the focal plane is adjusted using available manipulators in the projection lens system so that it is in closer conformity to the shape of the wafer surface in the exposure area. The control of the focal plane shape can be integrated with the leveling control which determines the height and tilt of the wafer surface.
|
申请公布号 |
US2002167651(A1) |
申请公布日期 |
2002.11.14 |
申请号 |
US20020066784 |
申请日期 |
2002.02.06 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BOONMAN MARCUS EMILE JOANNES;MULKENS JOHANNES CATHARINUS HUBERTUS;BUTLER HANS |
分类号 |
G03F7/22;G03F7/20;G03F7/207;G03F9/00;H01L21/027;(IPC1-7):G03B27/54 |
主分类号 |
G03F7/22 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|